Zhudong, Taiwan

Shu-Chen Lu


Average Co-Inventor Count = 15.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2013-2015

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3 patents (USPTO):Explore Patents

Title: Innovative Contributions of Inventor Shu-Chen Lu

Introduction

Shu-Chen Lu is a talented inventor based in Zhudong, Taiwan, with a remarkable portfolio comprising three patents. His work primarily focuses on advancements in photomask technology for integrated circuit devices, making significant contributions to the field of semiconductor manufacturing.

Latest Patents

Among his latest innovations, Shu-Chen Lu has developed a method for defining an intensity selective exposure photomask. This method provides an embodiment of a feed-forward approach to determine photomask patterns, utilizing design data associated with integrated circuit devices. By predicting the thickness of a coating layer based on this data, he generates a gradating pattern that forms the photomask. Additionally, he has created a unique intensity selective exposure photomask, also known as a gradated photomask. This photomask features two distinct regions, each containing arrays of sub-resolution features that block varying percentages of incident radiation. Such innovations play a vital role in enhancing the precision and efficiency of semiconductor fabrication.

Career Highlights

Shu-Chen Lu is affiliated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work within this esteemed organization has propelled advancements in the manufacturing processes of integrated circuits. Lu's patents reflect his commitment to driving innovation in technology that is critical to modern electronics.

Collaborations

Throughout his career, Shu-Chen has collaborated with notable colleagues, including Kuei Shun Chen and Chih-Yang Yeh. These partnerships have fostered a dynamic exchange of ideas and expertise, further enhancing the quality of their collective work in the field of semiconductor technology.

Conclusion

Shu-Chen Lu's contributions to innovation in photomask technology significantly impact the semiconductor industry. His inventive methods and collaborative spirit continue to inspire advancements that drive the future of integrated circuit manufacturing. As technology evolves, inventors like Shu-Chen Lu remain at the forefront, shaping the landscape of innovation.

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