Wan Jae Park

Title: Innovations by Wan Jae Park in Substrate Processing Technologies

Introduction

Wan Jae Park, an esteemed inventor based in Gyeonggi-do, South Korea, has made significant contributions to the field of substrate processing. With a total of five patents to his name, his innovative work is essential for advancing technologies in materials processing.

Latest Patents

Among his most notable patents, Park has developed an "Apparatus and method for processing substrate using plasma", which provides a substrate processing apparatus capable of efficiently controlling the selectivity ratio of silicon and oxide layers. This apparatus features a first space situated between an electrode and an ion blocker, a second space located between the ion blocker and a shower head, and a processing space dedicated to substrate processing under the shower head. Additionally, it incorporates a first supply hole for delivering a gas for plasma generation and a second supply hole for introducing another gas that mixes with plasma effluent. A key aspect of this design is the first coating layer on the shower head that contains nickel, which enhances the process's efficiency.

Another significant patent by Park involves an "Apparatus and method for processing substrate using plasma" aimed at increasing the uniformity of substrate processing. Similar to his previous innovation, this apparatus features a first space, a second space, and a processing space. It includes an ion blocker with separate first and second regions, and multiple supply ports designated for reaction gases, ensuring optimal gas distribution and improved processing outcomes.

Career Highlights

Wan Jae Park's career is marked by his work at Semes Co., Ltd., where he continues to drive advancements in substrate processing technologies. His innovative solutions have positioned him as a pivotal figure within the industry, catering to the demanding needs of modern fabrication processes.

Collaborations

Throughout his career, Park has collaborated with notable colleagues such as Dong Sub Oh and Min Sung Han. These partnerships reflect a shared vision for innovation and excellence in technology, enabling the development of cutting-edge solutions for substrate processing.

Conclusion

In conclusion, Wan Jae Park's inventive spirit and dedication to advancing substrate processing technologies are evident through his patented innovations. His work not only enhances the efficiency and uniformity of substrate processing but also underscores the collaborative efforts within his field. As he continues to innovate at Semes Co., Ltd., Park remains a key contributor to the world of materials processing.