The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2026
Filed:
Dec. 12, 2022
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Myoungsub Noh, Hwaseong-si, KR;
Seong Gil Lee, Hwaseong-si, KR;
Dong-Hun Kim, Gunpo-si, KR;
Dong Sub Oh, Busan, KR;
Jountaek Koo, Seoul, KR;
Wan Jae Park, Hwaseong-si, KR;
Assignee:
SEMES CO., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/32091 (2013.01); H01J 37/32357 (2013.01); H01J 37/3244 (2013.01); H01J 37/32834 (2013.01);
Abstract
The apparatus includes a plasma chamber and a process chamber separated by an ion blocker. A plasma power source excites a first treatment gas into radicals, which mix with a second treatment gas in the process chamber to treat a substrate. A controller manages gas flow and power for cyclic treatments.