The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2025
Filed:
Aug. 11, 2022
Semes Co., Ltd., Chungcheongnam-do, KR;
Seong Gil Lee, Gyeonggi-do, KR;
Young Je Um, Busan, KR;
Myoung Sub Noh, Gyeonggi-do, KR;
Dong Sub Oh, Busan, KR;
Min Sung Han, Gyeonggi-do, KR;
Dong Hun Kim, Seoul, KR;
Wan Jae Park, Gyeonggi-do, KR;
SEMES CO, LTD., Chungcheongnam-do, KR;
Abstract
A substrate processing apparatus using plasma capable of efficiently controlling the selectivity ratio of a silicon layer and an oxide layer is provided. The substrate processing apparatus comprises a first space disposed between an electrode and an ion blocker; a second space disposed between the ion blocker and a shower head; a processing space under the shower head for processing a substrate; a first supply hole for providing a first gas for generating plasma to the first space; a second supply hole for providing a second gas to be mixed with an effluent of the plasma to the second space; and a first coating layer formed on a first surface of the shower head facing the second space, not formed on a second surface of the shower head facing the processing space, and containing nickel.