Myoung Sub Noh

Title: Myoung Sub Noh: Innovator in Plasma Technology

Introduction

Myoung Sub Noh is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of plasma technology, particularly in substrate processing and semiconductor device fabrication. With a total of five patents to his name, Noh's work has advanced the capabilities of plasma applications in various industries.

Latest Patents

One of Noh's latest patents is a substrate processing apparatus and method using plasma. This invention focuses on maximizing plasma uniformity during substrate processing. The apparatus includes a processing space and a plasma generating module with multiple electrodes and micro plasma cells. This design allows for the precise control of energy levels in different micro plasma cells, resulting in varied radical generation. Another notable patent is a method for fabricating semiconductor devices, which enhances electrical characteristics and reliability. This method involves a series of plasma processes to effectively manage the layers of materials in semiconductor fabrication.

Career Highlights

Myoung Sub Noh is currently employed at Semes Co., Ltd., where he continues to innovate in the field of plasma technology. His work has been instrumental in developing advanced processing techniques that improve the efficiency and effectiveness of semiconductor manufacturing.

Collaborations

Noh collaborates with talented colleagues, including Young Je Um and Dong Sub Oh. Their combined expertise contributes to the innovative projects at Semes Co., Ltd., fostering a collaborative environment that drives technological advancements.

Conclusion

Myoung Sub Noh's contributions to plasma technology and semiconductor fabrication are noteworthy. His innovative patents and collaborative efforts position him as a key figure in advancing these critical fields.