The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2024
Filed:
Jul. 02, 2021
Semes Co., Ltd., Chungcheongnam-do, KR;
Young Je Um, Busan, KR;
Joun Taek Koo, Seoul, KR;
Wan Jae Park, Gyeonggi-do, KR;
Dong Hun Kim, Seoul, KR;
Seong Gil Lee, Gyeonggi-do, KR;
Ji Hwan Lee, Incheon, KR;
Dong Sub Oh, Busan, KR;
Myoung Sub Noh, Gyeonggi-do, KR;
Du Ri Kim, Incheon, KR;
SEMES Co., Ltd., Chungcheongnam-do, KR;
Abstract
A substrate treating apparatus and a substrate treating system including the same are disclosed, in which the number of heat treatment chambers such as anneal chambers may be varied. The substrate treating apparatus includes a first chamber heat-treating a substrate; and a second chamber treating the substrate in another way different from heat-treatment, wherein the number of the first chambers is varied depending on the number of the second chambers that need heat treatment for the substrate.