Du Ri Kim

Title: Du Ri Kim: Innovator in Plasma Processing Technology

Introduction

Du Ri Kim is a prominent inventor based in Incheon, South Korea. He has made significant contributions to the field of plasma processing technology, holding a total of four patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods, particularly in semiconductor fabrication.

Latest Patents

One of Du Ri Kim's latest patents is a substrate processing apparatus and method using plasma. This invention aims to maximize plasma uniformity during substrate processing. The apparatus includes a processing space and a plasma generating module with multiple electrodes arranged in parallel. The method involves providing a process gas to micro plasma cells, allowing for different energy levels to be applied, which results in varying amounts of radicals in the generated plasma.

Another notable patent is a method for fabricating semiconductor devices and an apparatus for processing substrates using plasma. This method improves the electrical characteristics and reliability of semiconductor devices. It involves stacking oxide and nitride films on a substrate and utilizing plasma processes to create trenches and chamfer the exposed films.

Career Highlights

Du Ri Kim is currently employed at Semes Co., Ltd., where he continues to innovate in the field of plasma technology. His work has been instrumental in advancing semiconductor manufacturing processes, contributing to the industry's growth and development.

Collaborations

Du Ri Kim collaborates with talented individuals such as Wan Jae Park and Young Je Um. Their combined expertise enhances the research and development efforts at Semes Co., Ltd.

Conclusion

Du Ri Kim's contributions to plasma processing technology have made a significant impact on the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in this critical field.