The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 20, 2025

Filed:

Apr. 08, 2022
Applicant:

Semes Co., Ltd., Cheonan-si, KR;

Inventors:

Seong Gil Lee, Hwaseong-si, KR;

Myoung Sub Noh, Hwaseong-si, KR;

Dong-Hun Kim, Seoul, KR;

Young Je Um, Busan, KR;

Dong Sub Oh, Busan, KR;

Jun Taek Koo, Seoul, KR;

Wan Jae Park, Hwaseong-si, KR;

Assignee:

SEMES CO., LTD., Cheonan-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32724 (2013.01); H01J 37/32422 (2013.01); H01J 37/32449 (2013.01); H01J 37/32834 (2013.01); H01J 2237/2007 (2013.01); H01J 2237/334 (2013.01);
Abstract

A substrate treating method includes a temperature stabilizing step for stabilizing a temperature of the substrate to a process temperature in a treating space for treating a substrate, a pressure stabilizing step for stabilizing a pressure of a plasma space for generating a plasma and a pressure of the treating space to a process, the plasma space fluid communicating with the treating space, and a treating step for generating the plasma at the plasma space and treating the substrate using the plasma.


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