Min Sung Han

Title: Min Sung Han: Innovator in Substrate Processing Technology

Introduction

Min Sung Han is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 6 patents. His work focuses on enhancing the efficiency and uniformity of substrate processing using plasma technology.

Latest Patents

Among his latest innovations, Min Sung Han has developed an apparatus and method for processing substrates using plasma. This substrate processing apparatus is designed to efficiently control the selectivity ratio of a silicon layer and an oxide layer. The apparatus features a first space located between an electrode and an ion blocker, a second space between the ion blocker and a shower head, and a processing space beneath the shower head for substrate processing. It includes a first supply hole for providing a first gas to generate plasma and a second supply hole for mixing a second gas with the plasma effluent. Additionally, a first coating layer containing nickel is formed on the shower head's surface facing the second space.

Another notable patent by Min Sung Han focuses on increasing the uniformity of substrate processing. This apparatus also comprises a first space, a second space, and a processing space. The ion blocker in this design includes two separated regions and multiple supply ports for delivering reaction gases. The shower head is designed with regions corresponding to the ion blocker's regions, ensuring efficient gas supply for optimal substrate processing.

Career Highlights

Min Sung Han is currently employed at Semes Co., Ltd., where he continues to innovate in the field of substrate processing. His work has been instrumental in advancing technologies that improve the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Throughout his career, Min Sung Han has collaborated with notable colleagues, including Yoon Jong Ju and Wan Jae Park. These collaborations have contributed to the development of cutting-edge technologies in substrate processing.

Conclusion

Min Sung Han is a key figure in the field of substrate processing technology, with a focus on plasma applications. His innovative patents and contributions to Semes Co., Ltd. highlight his commitment to advancing the industry. His work continues to influence the future of semiconductor manufacturing.