The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Nov. 18, 2020
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Ji-Hwan Lee, Suwon-si, KR;
Seong Gil Lee, Hwaseong-si, KR;
Dong Sub Oh, Busan, KR;
Myoungsub Noh, Seoul, KR;
Dong-Hun Kim, Seoul, KR;
Wan Jae Park, Hwaseong-si, KR;
Assignee:
SEMES CO., LTD., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01J 37/32 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); H01J 37/3244 (2013.01); H01J 37/32715 (2013.01); H01J 37/32788 (2013.01); H01L 21/68764 (2013.01); H01J 2237/3344 (2013.01);
Abstract
A method for processing a substrate includes providing the substrate, a film being formed on the substrate, performing pretreatment to surface-treat the film formed on the substrate using a treatment gas in a plasma state, and performing, after the pretreatment, liquid treatment to remove the film from the substrate by supplying a treatment liquid onto the substrate.