Suwon, South Korea

Ji-hwan Lee

This inventor holds 3 USPTO granted patents and 2 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2024-2025.

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: Ji-hwan Lee: Innovator in Substrate Treatment Technologies

Introduction

Ji-hwan Lee is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of substrate treatment technologies, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods.

Latest Patents

Ji-hwan Lee's latest patents include innovative technologies that improve substrate treatment processes. One of his notable inventions is a support unit and substrate treating apparatus. This invention features a support plate designed to hold a substrate, equipped with an electrostatic electrode that provides electrostatic force to the substrate. Additionally, it includes a heater for heating the substrate, an insulating plate for thermal insulation, and a bimetal member that compensates for bending due to heat. The bimetal member allows for the pin to move up or down based on thermal deformation differences.

Another significant patent is a method for treating substrates, which involves providing a substrate with a film, performing pretreatment using a treatment gas in a plasma state, and subsequently conducting liquid treatment to remove the film from the substrate. These advancements showcase Ji-hwan Lee's commitment to improving substrate processing techniques.

Career Highlights

Ji-hwan Lee is currently employed at Semes Co., Ltd., where he continues to develop innovative solutions in substrate treatment. His work has positioned him as a key figure in the industry, contributing to advancements that enhance manufacturing processes.

Collaborations

Throughout his career, Ji-hwan Lee has collaborated with notable colleagues, including Wan Jae Park and Kyung Man Kim. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Ji-hwan Lee's contributions to substrate treatment technologies reflect his dedication to innovation and excellence in his field. His patents and ongoing work at Semes Co., Ltd. continue to influence the industry positively.

Profile summary based on public USPTO records.
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