The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2025
Filed:
Jun. 30, 2022
Applicant:
Semes Co., Ltd., Cheonan-si, KR;
Inventors:
Yoon Jong Ju, Hwaseong-si, KR;
Seong Gil Lee, Hwaseong-si, KR;
Jae Hwan Kim, Gwangmyeong-si, KR;
Wan Jae Park, Hwaseong-si, KR;
Hye Joon Kheel, Hwaseong-si, KR;
Ji Hoon Park, Suwon-si, KR;
Young Je Um, Busan, KR;
Assignee:
SEMES CO., LTD., Chungcheongnam-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32449 (2013.01); H01J 37/32422 (2013.01); H01L 21/31116 (2013.01); H01J 2237/334 (2013.01);
Abstract
The present invention provides a substrate treating method, including: a first treatment operation of treating the substrate by using first plasma generated by exciting first gas; and a second treatment operation of treating the substrate by using second plasma generated by exciting second gas different from the first gas.