Tzu-Li Lee

Title: Tzu-Li Lee: Innovator in Semiconductor Technology

Introduction

Tzu-Li Lee is a prominent inventor based in Yunlin, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His innovative work has advanced the development of interconnect structures and semiconductor devices.

Latest Patents

One of Tzu-Li Lee's latest patents is titled "Interconnect structure and forming method thereof." This invention describes an interconnect structure that includes a first dielectric layer, a first metal layer, a second dielectric layer, a metal via, and a second metal layer. The design ensures that the first metal layer comprises two portions that are spaced apart, enhancing the overall functionality of the interconnect structure.

Another notable patent is "Semiconductor device and manufacturing method thereof." This method involves forming a fin structure with alternating layers of first and second semiconductor materials over a substrate. The process includes the formation of a dummy gate structure and the selective etching of the fin structure, which leads to the creation of source/drain epitaxial structures. This innovative approach significantly improves the manufacturing process of semiconductor devices.

Career Highlights

Tzu-Li Lee has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company and TSMC Nanjing Company, Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Tzu-Li Lee has collaborated with notable colleagues such as Jian-Hong Lin and Kuo-Yen Liu. These partnerships have fostered a creative environment that has led to the development of innovative solutions in the semiconductor field.

Conclusion

Tzu-Li Lee's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the advancement of semiconductor devices and manufacturing methods.