Company Filing History:

82 out of 5,966

Shin-etsu Chemical Co., Ltd.

Nippon Telegraph and Telephone Corporation

patents

where one patent can have more than one assignee

Years Active: 1999-2014

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83 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8921025 - Positive resist compositions and patterning process (2014-12-30),

2. 8658346 - Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition (2014-02-25),

3. 8426105 - Resist-modifying composition and pattern forming process (2013-04-23),

4. 8420290 - Acetal compounds and their preparation, polymers, resist compositions and patterning process (2013-04-16),

5. 8367310 - Pattern forming process and resist-modifying composition (2013-02-05),

6. 8329384 - Resist-modifying composition and pattern forming process (2012-12-11),

7. 8247166 - Double patterning process (2012-08-21),

8. 8129099 - Double patterning process (2012-03-06),

9. 8062831 - Carboxyl-containing lactone compound, polymer, resist composition, and patterning process (2011-11-22),

10. 7985528 - Positive resist composition and patterning process (2011-07-26),

11. 7981589 - Fluorinated monomer, fluorinated polymer, resist composition and patterning process (2011-07-19),

12. 7871752 - Lactone-containing compound, polymer, resist composition, and patterning process (2011-01-18),

13. 7868199 - Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process (2011-01-11),

14. 7833694 - Lactone-containing compound, polymer, resist composition, and patterning process (2010-11-16),

15. RE41580 - Lactone-containing compounds, polymers, resist compositions, and patterning method (2010-08-23),

Title: Tsunehiro Nishi: Pioneering Innovations in Technology

Introduction:

Tsunehiro Nishi, a visionary inventor based in Joetsu, JP, is widely acclaimed for his unwavering commitment to innovation and relentless pursuit of excellence in the field of technology. With a remarkable portfolio of 83 patents, his groundbreaking contributions have left an indelible mark on the world of inventions, inspiring countless inventors and researchers to push the boundaries of what is achievable in the realm of technology.

Latest Patents:

Among his latest patents is the "Positive resist compositions and patterning process," a revolutionary invention that comprises a unique resin component and acid generator. This composition, specifically designed for ArF lithography, enables the formation of patterns with exceptional mask fidelity and minimal line width roughness, setting new standards in the industry. Additionally, his "Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition" patent showcases his expertise in creating intricate patterns with high film retentivity.

Career Highlights:

Tsunehiro Nishi's illustrious career has seen him make significant contributions to renowned companies such as Shin-Etsu Chemical Co., Ltd. and Eudyna Devices Inc. His innovative spirit and technical prowess have been instrumental in driving forward technological advancements, earning him recognition as a trailblazer in the field.

Collaborations:

Throughout his career, Tsunehiro Nishi has collaborated closely with esteemed individuals in the industry, including Takeshi Kinsho and Koji Hasegawa. These collaborations have led to the development of cutting-edge technologies and groundbreaking inventions, further solidifying his reputation as a visionary inventor.

Conclusion:

In conclusion, Tsunehiro Nishi's dedication to innovation and his groundbreaking inventions have cemented his legacy as a trailblazer in the world of technology. His relentless pursuit of excellence and unwavering commitment to pushing the boundaries of what is possible continue to inspire future generations of inventors and researchers to strive for greatness in the realm of inventions.

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2 patents (EPO):

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