The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2013
Filed:
May. 25, 2010
Takeru Watanabe, Joetsu, JP;
Masashi Iio, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Masashi Iio, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A patterning process includes (1) coating a first positive resist composition onto a substrate, baking, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) coating a resist-modifying composition onto the first resist pattern and heating to effect modifying treatment, and (3) coating a second positive resist composition, baking, exposing, post-exposure baking, and alkali developing to form a second resist pattern. The resist-modifying composition comprises a carbamate compound and a solvent.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile