The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2011
Filed:
Jul. 26, 2007
Koji Hasegawa, Joetsu, JP;
Tsunehiro Nishi, Joestu, JP;
Takeshi Kinsho, Joetsu, JP;
Seiichiro Tachibana, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Tsunehiro Nishi, Joestu, JP;
Takeshi Kinsho, Joetsu, JP;
Seiichiro Tachibana, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Lactone-containing compounds having formula (1) are novel wherein Ris H, F, methyl or trifluoromethyl, Rand Rare monovalent hydrocarbon groups, or Rand Rmay together form an aliphatic hydrocarbon ring, Ris H or COR, Ris a monovalent hydrocarbon group, W is CH, O or S, and kis 0 or 1. They are useful as monomers to produce polymers which are transparent to radiation≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, pattern edge roughness, pattern density dependency and exposure margin.