The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2012
Filed:
May. 24, 2010
Takeru Watanabe, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Masashi Iio, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Masashi Iio, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A patterning process includes (1) coating a first positive resist composition onto a substrate, baking, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) coating a resist-modifying composition onto the first resist pattern and heating to effect modifying treatment, and (3) coating a second positive resist composition, baking, exposing, post-exposure baking, and alkali developing to form a second resist pattern. The resist modifying composition comprises a base resin comprising recurring units having formula (1) wherein Ais alkylene, Ris H or methyl, Ris alkyl or bond together to form a nitrogen-containing heterocycle, and an alcohol-based solvent.