The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2013
Filed:
Nov. 25, 2009
Koji Hasegawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd, Tokyo, JP;
Abstract
An acetal compound of formula (1) is provided wherein Ris H, methyl or trifluoromethyl, Ris a monovalent C-Chydrocarbon group, Rand Rare H or a monovalent C-Chydrocarbon group, Rand Rmay together form an aliphatic hydrocarbon ring, and Xis a single bond or a divalent C-Chydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.