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Masayoshi Sagehashi

USPTO Granted Patents = 73 (Patent Applications = 12)

EPO Patents = 12 (Patent Applications = 13)

Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 141(Granted Patents)

Forward Citations (Not Self Cited) = 134(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Jyoetsu, JP (2014 - 2019)
Joetsu, JP (2013 - 2024)

Company Filing History:

73 out of 5,975

Shin-etsu Chemical Co., Ltd.

Years Active: 2013-2025

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Areas of Expertise:

Chemically Amplified Resist

Positive Resist Composition

Negative Resist Composition

Patterning Process

Polymer Compound

Monomer

Resist Composition

Conductive Polymer

Epoxy Compound

Tetracarboxylic Acid Diester

Sulfonium Salt

Fluorinated Monomer

73 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12275693 - Onium salt, chemically amplified resist composition and patterning process (2025-04-14),

2. 12032289 - Polymer, chemically amplified resist composition and patterning process (2024-07-09),

3. 12013639 - Positive resist material and patterning process (2024-06-18),

4. 11662663 - Substrate protective film-forming composition and pattern forming process (2023-05-30),

5. 11579529 - Positive resist composition and patterning process (2023-02-14),

6. 11548844 - Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process (2023-01-10),

7. 11492337 - Epoxy compound, resist composition, and pattern forming process (2022-11-08),

8. 11435666 - Salt compound, chemically amplified resist composition, and patterning process (2022-09-06),

9. 11286320 - Polymerizable monomer, polymer compound for conductive polymer, and method for producing the polymer compound (2022-03-29),

10. 11009793 - Monomer, polymer, resist composition, and patterning process (2021-05-18),

11. 10591819 - Monomer, polymer, resist composition, and patterning process (2020-03-17),

12. 10527939 - Monomer, polymer, resist composition, and patterning process (2020-01-07),

13. 10457779 - Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film (2019-10-29),

14. 10363555 - Polymer compound for conductive polymer and method for producing the same (2019-07-30),

15. 10303056 - Resist composition and patterning process (2019-05-28),

Title: The Innovative Mind of Masayoshi Sagehashi

Introduction: Masayoshi Sagehashi, a distinguished inventor hailing from Joetsu, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Masayoshi Sagehashi's recent patents include cutting-edge advancements in robotics, artificial intelligence, and renewable energy technologies, solidifying his position as a pioneer in the industry.

Career Highlights: With a career spanning over two decades, Masayoshi Sagehashi has held key roles in leading tech companies, where he spearheaded research and development projects that have led to numerous successful patent applications.

Collaborations: Throughout his career, Masayoshi Sagehashi has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Masayoshi Sagehashi's relentless pursuit of innovation and his passion for pushing the boundaries of technology have cemented his legacy as a visionary inventor in the global landscape of technological advancements.

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