The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2023
Filed:
May. 21, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Daisuke Domon, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Masaaki Kotake, Joetsu, JP;
Naoya Inoue, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 1/20 (2012.01); G03F 1/22 (2012.01); C07C 33/30 (2006.01); C07C 69/54 (2006.01); C08F 220/30 (2006.01); G03F 1/60 (2012.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
C07C 33/30 (2013.01); C07C 69/54 (2013.01); C08F 212/24 (2020.02); G03F 1/20 (2013.01); G03F 1/22 (2013.01); G03F 1/60 (2013.01); G03F 7/0382 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); C08F 220/283 (2020.02); C08F 220/301 (2020.02); C08F 220/303 (2020.02); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract
A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.