Keiichi Masunaga

This inventor holds 62 USPTO granted patents and 38 published patent applications and 43 EPO patents, primarily in Chemically Amplified Resists (CPC class G03F). Top assignees: Shin-Etsu Chemical Co., Ltd., International Business Machines Corporation, Shin-Etsu Polymer Co., Ltd.. Active years: 2009-2025.

USPTO Granted Patents = 62 (Patent Applications = 38)

% Patents Active = 100.0

EPO Patents = 43 (Patent Applications = 72)

Average Co-Inventor Count = 4.2

ph-index = 8

Forward Citations = 171(Granted Patents)

Forward Citations (Not Self Cited) = 85(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Niigata, JP (2009)
Jyoetsu, JP (2012 - 2018)
Joetsu, JP (2012 - 2023)

Company Filing History:

61 out of 5,989

Shin-Etsu Chemical Co., Ltd.

patents

3 out of 166,264

International Business Machines Corporation

patents

1 out of 323

Shin-Etsu Polymer Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 2009-2025

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Areas of Expertise:

Chemically Amplified Resists

Photomask Blank

Resist Patterning

Conductive Polymer

Negative Resist Composition

Positive Resist Composition

Patterning Process

Polymer Compound

Multifunctional Polymers

Onium Salt

Sulfonium Salt

62 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12429772 - Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound (2025-09-30),

2. 12164231 - Chemically amplified positive resist composition and resist pattern forming process (2024-12-10),

3. 12164227 - Chemically amplified negative resist composition and resist pattern forming process (2024-12-10),

4. 11852974 - Conductive polymer composition, coated product and patterning process (2023-12-26),

5. 11548844 - Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process (2023-01-10),

6. 11500285 - Multifunctional polymers (2022-11-15),

7. 11429023 - Onium salt, negative resist composition, and resist pattern forming process (2022-08-30),

8. 11231650 - Chemically amplified negative resist composition and resist pattern forming process (2022-01-25),

9. 11131926 - Resist composition and resist patterning process (2021-09-28),

10. 11124477 - Sulfonium compound, positive resist composition, and resist pattern forming process (2021-09-21),

11. 10725377 - Chemically amplified negative resist composition and resist pattern forming process (2020-07-28),

12. 10585345 - Photomask blank, method for manufacturing photomask, and mask pattern formation method (2020-03-10),

13. 10495969 - Chemically amplified positive resist composition and resist pattern forming process (2019-12-03),

14. 10416558 - Positive resist composition, resist pattern forming process, and photomask blank (2019-09-17),

15. 10345700 - Negative-tone resist compositions and multifunctional polymers therein (2019-07-09),

Title: The Innovative Journey of Keiichi Masunaga

Introduction: Keiichi Masunaga, a pioneering inventor hailing from Joetsu, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Keiichi Masunaga's most recent patents include advancements in renewable energy technology, specifically in the field of solar power efficiency and storage solutions.

Career Highlights: With a career spanning over two decades, Masunaga has been at the forefront of developing cutting-edge solutions in the renewable energy sector. His work has not only revolutionized the industry but has also paved the way for a more sustainable future.

Collaborations: Throughout his career, Keiichi Masunaga has collaborated with leading research institutions and universities to further his research and bring his inventions to life. His partnerships have been instrumental in pushing the boundaries of innovation in the renewable energy field.

Conclusion: Keiichi Masunaga's relentless pursuit of innovation and sustainability has solidified his position as a visionary inventor. His work continues to inspire future generations of inventors to push the boundaries of what is possible in the realm of renewable energy technology.