The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Dec. 26, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Masaaki Kotake, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 381/12 (2006.01); G03F 7/033 (2006.01); C07C 317/04 (2006.01); C07C 317/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C07C 317/04 (2013.01); C07C 317/28 (2013.01); C07C 381/12 (2013.01); G03F 7/033 (2013.01);
Abstract
A positive resist composition comprising a polymer adapted to be decomposed under the action of acid to increase its solubility in alkaline developer and a sulfonium compound of formula (A) has a high resolution. When the resist composition is processed by lithography, a pattern with minimal LER can be formed.
Quick Actions:
Kotake, Masaaki. (2019). Chemically amplified positive resist composition and resist pattern forming process (U.S. Patent No. 10495969). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10495969
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile