The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2021
Filed:
Sep. 04, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Naoya Inoue, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Daisuke Domon, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Masaaki Kotake, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C07C 311/08 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); C08L 45/00 (2006.01); C08L 33/14 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
C07C 311/08 (2013.01); G03F 7/0045 (2013.01); G03F 7/0395 (2013.01); G03F 7/322 (2013.01); C08L 33/14 (2013.01); C08L 45/00 (2013.01);
Abstract
A novel sulfonium compound has formula (A). A positive resist composition comprising a polymer and a quencher containing the sulfonium compound is improved in resolution and LER during pattern formation and has storage stability. In formula (A), R, R, R, and Rare independently a C-Cmonovalent hydrocarbon group, p is an integer of 0-5, q is an integer of 0-5, and r is an integer of 0-4.