The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Dec. 27, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Masaaki Kotake, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Kenji Yamada, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07C 381/12 (2006.01); C07C 317/04 (2006.01); C07C 317/28 (2006.01); C07C 303/32 (2006.01); C07C 323/20 (2006.01); C08F 212/14 (2006.01); G03F 7/32 (2006.01); G03F 7/20 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 303/32 (2013.01); C07C 317/04 (2013.01); C07C 317/28 (2013.01); C07C 323/20 (2013.01); C07C 381/12 (2013.01); C08F 212/14 (2013.01); G03F 7/0382 (2013.01); G03F 7/2002 (2013.01); G03F 7/2053 (2013.01); G03F 7/2059 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); C07C 2601/16 (2017.05); C08F 2800/10 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); G03F 7/2004 (2013.01); G03F 7/327 (2013.01);
Abstract
A negative resist composition comprising a sulfonium compound having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.