Joetsu, Japan

Kenji Yamada


 

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2018-2023

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7 patents (USPTO):

Title: Kenji Yamada: Innovator in Resist Composition Technology

Introduction

Kenji Yamada is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of resist composition technology, holding a total of seven patents. His work focuses on enhancing the performance and efficiency of resist materials used in photolithography.

Latest Patents

One of Kenji Yamada's latest patents is related to a resist composition and patterning process. This invention comprises a polymer compound with specific repeating units that change polarity when exposed to acid. The resist composition boasts high sensitivity, a wide depth of focus (DOF), and excellent resolution. It also reduces line edge roughness (LER), line width roughness (LWR), and critical dimension uniformity (CDU), ensuring good pattern shape after exposure and outstanding etching resistance.

Another notable patent involves a novel carboxylic acid iodonium salt and a resist composition that utilizes this salt as a quencher. This composition, when processed through photolithography using various laser technologies, results in improved resist patterns characterized by enhanced rectangularity, modulation transfer function (MEF), LWR, and CDU.

Career Highlights

Kenji Yamada is currently employed at Shin-Etsu Chemical Co., Ltd., where he continues to innovate in the field of resist materials. His work has been instrumental in advancing the capabilities of photolithography processes, which are critical in semiconductor manufacturing.

Collaborations

Kenji has collaborated with notable colleagues such as Satoshi Watanabe and Masaki Ohashi. Their combined expertise has contributed to the development of cutting-edge technologies in resist compositions.

Conclusion

Kenji Yamada's contributions to resist composition technology have significantly impacted the semiconductor industry. His innovative patents reflect his commitment to enhancing the performance of photolithography materials.

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