The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2018
Filed:
Aug. 02, 2017
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Keiichi Masunaga, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Masaaki Kotake, Joetsu, JP;
Kenji Yamada, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); G03F 7/20 (2006.01); C07C 303/32 (2006.01); C07C 309/01 (2006.01); C07C 309/06 (2006.01); C07C 309/09 (2006.01); C07C 309/17 (2006.01); C07C 309/19 (2006.01); C07C 309/23 (2006.01); C07C 309/24 (2006.01); C07C 69/63 (2006.01); C08F 212/02 (2006.01); C08F 220/22 (2006.01); C08F 220/24 (2006.01); C08F 220/38 (2006.01); C08F 224/00 (2006.01); C08F 228/02 (2006.01); G03F 7/038 (2006.01); G03F 7/32 (2006.01); C07C 309/04 (2006.01); C07C 309/31 (2006.01); C07C 309/30 (2006.01); C07C 309/29 (2006.01); C07C 309/58 (2006.01); C07C 309/35 (2006.01); C07C 309/44 (2006.01); C07C 69/753 (2006.01); C07C 309/32 (2006.01); C08F 222/10 (2006.01); C08F 220/30 (2006.01); G03F 7/16 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 69/753 (2013.01); C07C 303/32 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/17 (2013.01); C07C 309/19 (2013.01); C07C 309/23 (2013.01); C07C 309/24 (2013.01); C07C 309/29 (2013.01); C07C 309/30 (2013.01); C07C 309/31 (2013.01); C07C 309/32 (2013.01); C07C 309/35 (2013.01); C07C 309/44 (2013.01); C07C 309/58 (2013.01); C08F 212/02 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/30 (2013.01); C08F 220/38 (2013.01); C08F 222/10 (2013.01); C08F 224/00 (2013.01); C08F 228/02 (2013.01); G03F 7/0046 (2013.01); G03F 7/0382 (2013.01); G03F 7/2006 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); C08F 2220/283 (2013.01); C08F 2220/303 (2013.01); C08F 2220/382 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/38 (2013.01);
Abstract
A negative resist composition comprising (A) a sulfonium compound of betaine type and (B) a polymer is provided. The resist composition is effective for controlling acid diffusion during the exposure step, exhibits a very high resolution during pattern formation, and forms a pattern with minimal LER.