The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2022
Filed:
Oct. 17, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Daisuke Domon, Joetsu, JP;
Naoya Inoue, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Masaaki Kotake, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 311/48 (2006.01); C07C 381/12 (2006.01); G03F 1/50 (2012.01); G03F 1/76 (2012.01); G03F 1/78 (2012.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 311/48 (2013.01); C07C 381/12 (2013.01); G03F 1/50 (2013.01); G03F 1/76 (2013.01); G03F 1/78 (2013.01); G03F 7/038 (2013.01); C07C 2601/14 (2017.05); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract
A negative resist composition comprising an onium salt having formula (A) and a base polymer is provided. The resist composition exhibits a high resolution during pattern formation and forms a pattern with minimal LER.