The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2019
Filed:
Sep. 08, 2014
International Business Machines Corporation, Armonk, NY (US);
Shin-etsu Chemical Co., Ltd., Joetsu-shi, Niigata-ken, JP;
Luisa D. Bozano, Los Gatos, CA (US);
Daisuke Domon, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Keiichi Masunaga, Joetsu, JP;
Martha I. Sanchez, Menlo Park, CA (US);
Daniel P. Sanders, San Jose, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Linda K. Sundberg, Los Gatos, CA (US);
Satoshi Watanabe, Joetsu, JP;
International Business Machines Corporation, Armonk, NY (US);
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A negative-tone resist composition is provided that contains a free photoacid generator and a multifunctional polymer covalently bound to a photoacid-generating moiety, where the composition is substantially free of cross-linking agents. Multifunctional polymers useful in conjunction with the resist composition are also provided, as is a process for generating a resist image on a substrate using the present compositions and polymers.