The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2020
Filed:
Apr. 10, 2019
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Masahiro Fukushima, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A monomer of formula (1a) or (1b) is provided wherein A is a polymerizable group, R-Rare monovalent hydrocarbon groups, Xis a divalent hydrocarbon, group, Zis an aliphatic group, Zforms an alicyclic group, k=0 or 1, m=1 or 2, n=1 to 4. A useful polymer is obtained by polymerizing the monomer. A resist composition comprising the polymer has improved development properties and is processed to form a negative pattern having high contrast, high resolution and etch resistance which is insoluble in alkaline developer.