Masahiro Fukushima

Title: Masahiro Fukushima: Innovator in Photolithography Technologies

Introduction

Masahiro Fukushima, based in Joetsu, Japan, is a distinguished inventor with an impressive portfolio of 48 patents. His significant contributions are particularly valuable in the realm of photolithography, a critical technology in semiconductor manufacturing.

Latest Patents

Fukushima's latest innovations include two notable patents:

1. **Sulfonium Salt, Chemically Amplified Resist Composition, and Patterning Process** - This patent introduces a novel sulfonium salt characterized by formula (1). The chemically amplified resist composition that incorporates this sulfonium salt as a photo-acid generator (PAG) boasts advantages such as high solvent solubility and enhanced lithography performance metrics like exposure latitude (EL) and line width roughness (LWR) when processed under high-energy radiation such as KrF or ArF excimer lasers, electron beams, or EUV.

2. **Onium Salt, Chemically Amplified Negative Resist Composition, and Pattern Forming Process** - This invention presents an onium salt that has a specific partial structure defined in formula (A). It allows for the substitution of the R and R groups with hydrocarbyl groups, which may include halogen substitutions. The resulting chemically amplified negative resist composition, using the onium salt as an acid generator, produces patterns with excellent profile quality, heightened sensitivity, improved dissolution contrast, reduced LWR, and enhanced critical dimension uniformity (CDU).

Career Highlights

Fukushima has been a pivotal member of Shin-Etsu Chemical Co., Ltd., where he has contributed to advancements in chemical photolithography solutions. His expertise in designing compositions for resist materials has greatly influenced the semiconductor industry, paving the way for miniaturization and enhanced performance of electronic devices.

Collaborations

Throughout his career, Fukushima has collaborated with notable coworkers including Jun Hatakeyama and Masaki Ohashi. These partnerships have fostered an innovative environment that encourages the advancement of photolithography technologies, culminating in several groundbreaking patents.

Conclusion

Masahiro Fukushima stands out as a lead inventor in photolithography innovations, with his work greatly impacting the semiconductor industry. Through his extensive patent portfolio and collaborative efforts at Shin-Etsu Chemical Co., Ltd., he continues to shape the future of technology, ensuring that high-performance materials and processes remain at the forefront of electronics manufacturing.