The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Aug. 02, 2021
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Masahiro Fukushima, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07D 211/94 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); C08F 212/14 (2006.01); C07D 405/12 (2006.01); C08F 220/18 (2006.01); C07D 207/46 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07D 207/46 (2013.01); C07D 211/94 (2013.01); C07D 405/12 (2013.01); C08F 212/24 (2020.02); C08F 220/1802 (2020.02); C08F 220/1806 (2020.02); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01);
Abstract
A resist composition comprising a quencher containing a nitroxyl radical having an iodized aliphatic hydrocarbyl group is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.