The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2024
Filed:
Sep. 16, 2020
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); C08F 212/14 (2006.01); C08F 220/28 (2006.01); C08F 220/40 (2006.01); C09D 125/18 (2006.01); C09D 133/08 (2006.01); C09D 133/14 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0388 (2013.01); C08F 212/24 (2020.02); C08F 220/283 (2020.02); C08F 220/40 (2013.01); C09D 125/18 (2013.01); C09D 133/08 (2013.01); C09D 133/14 (2013.01); G03F 7/039 (2013.01);
Abstract
A polymer comprising recurring units having a multiple bond-containing acid labile group, recurring units having a phenolic hydroxyl group, and recurring units adapted to generate an acid upon exposure is used to formulate a resist composition, which exhibits a high sensitivity, low LWR and improved CDU when processed by lithography using EUV of wavelength 13.5 nm.