Emiko Ono

Title: Emiko Ono: Innovator in Chemically Amplified Resist Compositions

Introduction

Emiko Ono is a prominent inventor based in Joetsu, Japan. She has made significant contributions to the field of chemically amplified resist compositions, holding a total of 2 patents. Her work focuses on developing advanced materials that enhance the performance of lithography processes.

Latest Patents

Emiko Ono's latest patents include innovative formulations that improve the efficiency and effectiveness of lithography. The first patent, titled "Polymer, chemically amplified resist composition and patterning process," describes a polymer that comprises recurring units with a multiple bond-containing acid labile group, a phenolic hydroxyl group, and units that generate acid upon exposure. This composition exhibits high sensitivity, low line width roughness (LWR), and improved critical dimension uniformity (CDU) when processed using extreme ultraviolet (EUV) lithography at a wavelength of 13.5 nm.

The second patent, "Salt compound, chemically amplified resist composition, and patterning process," introduces a novel salt with an amide bond in its anion structure. This chemically amplified resist composition demonstrates advantages such as minimal defects and enhanced sensitivity, LWR, modulation transfer function (MEF), and CDU when processed with high-energy radiation, including KrF excimer laser, ArF excimer laser, electron beam (EB), or EUV.

Career Highlights

Emiko Ono has established herself as a key figure in her field through her innovative research and development efforts. Her work at Shin-Etsu Chemical Co., Ltd. has positioned her as a leader in the advancement of resist materials for lithography applications.

Collaborations

Throughout her career, Emiko has collaborated with notable colleagues, including Masahiro Fukushima and Masayoshi Sagehashi. These partnerships have contributed to her success and the development of cutting-edge technologies in the industry.

Conclusion

Emiko Ono's contributions to the field of chemically amplified resist compositions have made a significant impact on lithography technology. Her innovative patents and collaborative efforts continue to drive advancements in this critical area of research.