The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2025
Filed:
Sep. 28, 2021
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Masahiro Fukushima, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 309/12 (2006.01); C07C 381/12 (2006.01); C07D 307/93 (2006.01); C08F 220/22 (2006.01); C08F 220/24 (2006.01); C08F 220/38 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C07D 307/93 (2013.01); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/382 (2020.02); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); C07C 2603/74 (2017.05);
Abstract
A sulfonium salt having formula (1) is novel. A chemically amplified resist composition comprising the sulfonium salt as a PAG has advantages including solvent solubility and improved lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV.