The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2024
Filed:
May. 27, 2021
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Masahiro Fukushima, Joetsu, JP;
Satoshi Watanabe, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Naoya Inoue, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 303/32 (2006.01); C07C 309/06 (2006.01); C07C 309/19 (2006.01); C07C 309/24 (2006.01); C07C 381/12 (2006.01); G03F 1/22 (2012.01); G03F 7/037 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
C07C 381/12 (2013.01); C07C 303/32 (2013.01); C07C 309/06 (2013.01); C07C 309/19 (2013.01); C07C 309/24 (2013.01); G03F 1/22 (2013.01); G03F 7/0045 (2013.01); G03F 7/037 (2013.01); G03F 7/0382 (2013.01); G03F 7/2004 (2013.01); G03F 7/26 (2013.01);
Abstract
An onium salt having a partial structure of formula (A) is provided wherein Rand Rare hydrogen or a C-Chydrocarbyl group in which hydrogen may be substituted by halogen and —CH— may be replaced by —O— or —C(═O)—, both Rand Rare not hydrogen at the same time, Rand Rmay bond together to form an aliphatic ring. A chemically amplified negative resist composition comprising the onium salt as acid generator forms a pattern of good profile having a high sensitivity, improved dissolution contrast, reduced LWR and improved CDU.