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For the Inventor, By the Inventor

Tokyo, Japan

Shin-Etsu Chemical Ltd.

USPTO Granted Patents = 156


Forward Citations = 36

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385 inventors (with patents filed for the assignee):

goldMedal Jun Hatakeyama (15 out of 576 patents)

silverMedal Nobuaki Matsumoto (7 out of 40 patents)

bronzeMedal Yoshinori Ogawa (7 out of 23 patents)

4.  Taichi Kitagawa (6 out of 21 patents)

5.  Kazunori Kondo (6 out of 53 patents)

6.  Masahiro Fukushima (6 out of 58 patents)

7.  Tsuneo Kimura (5 out of 76 patents)

8.  Hiroshi Hashigami (5 out of 40 patents)

9.  Daisuke Kori (5 out of 5 patents)

10.  Shunji Aoki (4 out of 44 patents)

11.  Masaki Takeuchi (4 out of 61 patents)

12.  Yoshihiro Nojima (4 out of 21 patents)

13.  Shinji Aoki (4 out of 14 patents)

14.  Toshiyuki Ozai (4 out of 39 patents)

15.  Kazuya Tobishima (4 out of 9 patents)


Core Competencies:
Diamond Substrate
Organic Film
Semiconductor Device
Quantum Dots
Silicone Composition
Thermal Conductivity
Optical Fiber
Photoacid Generator
Resist Composition
Adhesive Film
Rare Earth Elements
Lithographic Printing

156 patents:

1. 12772790 - Device transfer method, device transfer machine, target object transfer method, and target object transfer machine (2026-10-20),
2. 12769207 - Positive resist material and patterning process (2026-10-20),
3. 12767873 - Thermally conductive film (2026-10-20),
4. 12767552 - Titanium oxide particle-metal particle composition and method for producing same (2026-10-20),
5. RE51066 - Aqueous enteric coating composition (2026-10-13),
6. 12765320 - Method for fabricating (LED) dice using laser lift-off from a substrate to a receiving plate (2026-10-13),
7. 12765120 - Method to remove an isolation layer on the corner between the semiconductor light emitting device to the growth substrate (2026-10-13),
8. 12765019 - Laminated structure, semiconductor device and method for manufacturing laminated structure (2026-10-13),
9. 12761559 - Positive resist composition and patterning process (2026-10-13),
10. 12761555 - Positive resist material and patterning process (2026-10-13),
11. 12761553 - Resist composition and patterning process (2026-10-13),
12. 12761552 - Amine compound, chemically amplified resist composition, and patterning process (2026-10-13),
13. 12760202 - Polishing composition (2026-10-13),
14. 12760197 - Coating composition and coated article (2026-10-13),
15. 12759966 - (4Z,6E)-4,6-undecadienyl trimethylacetate and process for preparing (5Z,7E)-5,7-dodecadiene compound therefrom (2026-10-13),
Company Overview
Shin-Etsu Chemical Ltd., headquartered in Tokyo, Japan, is a leading player in the semiconductor manufacturing sector. The company specializes in advanced materials and technologies, including diamond substrates, organic films, and silicone compositions, which are essential for high-performance semiconductor devices. Shin-Etsu is also involved in the development of quantum dots, thermal conductivity solutions, optical fibers, and photoacid generators, positioning itself at the forefront of innovation in the semiconductor and materials science industries.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 20 2026

156 Patents

#416 in Tokyo

#832 in Japan

#5,261 in the World

Tokyo, JP
Tokyo, Japan

Shin-Etsu Chemical Ltd.

Forward Citations = 36

385 inventors:

goldMedal Jun Hatakeyama (15 out of 576 patents)

silverMedal Nobuaki Matsumoto (7 out of 40 patents)

bronzeMedal Yoshinori Ogawa (7 out of 23 patents)

4.  Taichi Kitagawa (6 out of 21 patents)

5.  Kazunori Kondo (6 out of 53 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Shin-Etsu Chemical Ltd.. Retrieved from https://idiyas.com/company/shin-etsu-chemical

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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