The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Apr. 28, 2022
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Naoki Yarita, Joetsu, JP;
Daijitsu Harada, Joetsu, JP;
Harunobu Matsui, Joetsu, JP;
Masaki Takeuchi, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A polishing composition including a colloidal silica containing colloidal silica particles, a pH adjusting agent, and a chelating agent provides a substrate that has a surface having a high flatness, low defects and a low surface roughness with low cost and high productivity, and a substrate having high surface quality suitable as a substrate for mask blanks such as a glass substrate containing SiOas a main component, particularly, as a substrate for mask blanks used in EUVL.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile