Naoki Yarita

Title: Naoki Yarita: Innovator in Mask Blank Glass Substrates

Introduction

Naoki Yarita is a prominent inventor based in Joetsu, Japan. He has made significant contributions to the field of materials science, particularly in the development of mask blank glass substrates. With a total of 2 patents to his name, Yarita's work is recognized for its innovative approach and technical precision.

Latest Patents

Yarita's latest patents focus on advanced mask blank glass substrates. The first patent describes a mask blank glass substrate that has a maximum value of a circularly averaged power spectral density of 1,000 nm or less at a spatial frequency of 0.1 μm or more and 20 μm or less. This maximum value is obtained by measuring the surface morphology of a region of 10 μm×10 μm using an atomic force microscope. The second patent reiterates similar specifications, emphasizing the importance of precision in the manufacturing process.

Career Highlights

Naoki Yarita is currently employed at Shin-Etsu Chemical Co., Ltd., a leading company in the chemical industry. His role involves research and development, where he applies his expertise to create innovative materials that meet the demands of modern technology.

Collaborations

Yarita has collaborated with notable colleagues, including Daijitsu Harada and Masaki Takeuchi. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in their respective fields.

Conclusion

Naoki Yarita's contributions to the field of mask blank glass substrates highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to precision and quality, making him a valuable asset in the industry.