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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12769207 B1

PDFFull Text
Date of Patent:
Oct. 20, 2026

Filed:

Jul. 07, 2022

Positive resist material and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Jun Hatakeyama, Joetsu, JP;

Naoki Ishibashi, Joetsu, JP;

Masayoshi Sagehashi, Joetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
C08F 220/40 (2006.01); C08F 212/14 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01); C08F 220/24 (2006.01); C08F 220/38 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 212/24 (2020.02); C08F 220/1804 (2020.02); C08F 220/1805 (2020.02); C08F 220/1806 (2020.02); C08F 220/22 (2013.01); C08F 220/24 (2013.01); C08F 220/38 (2013.01); C08F 220/40 (2013.01); G03F 7/0045 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01);
Abstract

A positive resist material contains an acid generator, and a base polymer containing a repeating unit having two carboxyl groups whose hydrogen atoms are substituted with two tertiary carbon atoms each bonded to a double bond or triple bond. The repeating unit having two carboxyl groups whose hydrogen atoms are substituted with two tertiary carbon atoms each bonded to a double bond or triple bond is represented by a repeating unit-a in the following formula (1). Thus, the present invention provides: a positive resist material having higher sensitivity than conventional positive resist materials and smaller dimensional variation; and a patterning process.

Find Patent Forward Citations

Hatakeyama, Jun. (2026). Positive resist material and patterning process (U.S. Patent No. 12769207). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12769207

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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