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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12761552 B1

PDFFull Text
Date of Patent:
Oct. 13, 2026

Filed:

Sep. 20, 2022

Amine compound, chemically amplified resist composition, and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Masahiro Fukushima, Joetsu, JP;

Masaki Ohashi, Joetsu, JP;

Kazuhiro Katayama, Joetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

WHDA, LLP

Primary Examiner:

Mark F Huff

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07D 209/56 (2006.01); C07D 275/06 (2006.01); C07D 307/33 (2006.01); C07D 307/93 (2006.01); C07D 327/04 (2006.01); C08F 220/18 (2006.01); C08F 220/38 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07D 209/56 (2013.01); C07D 275/06 (2013.01); C07D 307/33 (2013.01); C07D 307/93 (2013.01); C07D 327/04 (2013.01); C08F 220/1806 (2020.02); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1818 (2020.02); C08F 220/382 (2020.02); G03F 7/004 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01);
Abstract

A resist composition comprising a quencher in the form of an amine compound having a highly polar lactone or sultone ring and an acid labile group in a common molecule is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.

Find Patent Forward Citations

Fukushima, Masahiro. (2026). Amine compound, chemically amplified resist composition, and patterning process (U.S. Patent No. 12761552). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12761552

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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