The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Jun. 28, 2023
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventor:
Jun Hatakeyama, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); G03F 7/2006 (2013.01);
Abstract
The positive resist composition comprises a compound having a nitrobenzyl ester group bonded to an iodized aromatic ring. The positive resist composition exhibits a higher sensitivity and resolution than the prior art and forms a pattern of good profile with low edge roughness or improved CDU after exposure and development. The compound has the formula (1):
Hatakeyama, Jun. (2026). Positive resist composition and patterning process (U.S. Patent No. 12761559). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12761559
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile