The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Aug. 22, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Masahiro Fukushima, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Teppei Adachi, Joetsu, JP;
Kazuhiro Katayama, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/038 (2006.01); G03F 7/004 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/2024 (2013.01); C08F 220/283 (2020.02); C08F 220/303 (2020.02);
Abstract
A monomer and polymer having a substituent group capable of polarity switch under the action of acid are provided. A resist composition comprising the polymer forms at a high resolution a negative pattern insoluble in alkaline developer and having high etch resistance.