The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 05, 2013
Filed:
Feb. 18, 2010
Takeru Watanabe, Joetsu, JP;
Masashi Iio, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Masashi Iio, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A patterning process includes (1) coating and baking a first positive resist composition to form a first resist film, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) applying a resist-modifying composition to the first resist pattern and heating to modify the first resist pattern, (3) coating and baking a second positive resist composition to form a second resist film, exposing, post-exposure baking, and alkali developing to form a second resist pattern. The modified first resist film has a contact angle with pure water of 50°-85°.