The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2011

Filed:

Jan. 30, 2007
Applicants:

Koji Hasegawa, Joetsu, JP;

Takeshi Kinsho, Joetsu, JP;

Tsunehiro Nishi, Joetsu, JP;

Masaki Ohashi, Joetsu, JP;

Takeru Watanabe, Joetsu, JP;

Inventors:

Koji Hasegawa, Joetsu, JP;

Takeshi Kinsho, Joetsu, JP;

Tsunehiro Nishi, Joetsu, JP;

Masaki Ohashi, Joetsu, JP;

Takeru Watanabe, Joetsu, JP;

Assignee:

Eudyna Devices Inc., Yamanashi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 69/74 (2006.01);
U.S. Cl.
CPC ...
Abstract

Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein Ris H or a monovalent C-Chydrocarbon group in which any —CH— moiety may be replaced by —O— or —C(═O)—, Ris H or a monovalent C-Chydrocarbon group, Rand Rare H or a monovalent C-Chydrocarbon group, and Mis Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.


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