The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2011
Filed:
Jun. 25, 2008
Koji Hasegawa, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Katsuhiro Kobayashi, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Koji Hasegawa, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Katsuhiro Kobayashi, Joetsu, JP;
Tsunehiro Nishi, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. Ris H or monovalent C-Chydrocarbon group, Ris H, F, methyl or trifluoromethyl, Rand Rare H or a monovalent C-Chydrocarbon group, or Rand Rmay form an aliphatic hydrocarbon ring, and A is a divalent C-Chydrocarbon group
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile