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For the Inventor, By the Inventor

Joetsu, Japan

Katsuhiro Kobayashi

This inventor holds 23 USPTO granted patents and 3 EPO patents, primarily in Photoresist Technology. Top assignee: Shin-Etsu Chemical Co., Ltd.. Active years: 2004-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuhiro Kobayashi. Retrieved from https://idiyas.com/inventor/katsuhiro-kobayashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23

% Patents Active = 91.3


Average Co-Inventor Count = 4.1

ph-index = 8

Forward Citations = 188(Granted Patents)


Location History:

  • Niigata-ken, JP (2004 - 2007)
  • Joetsu, JP (2009 - 2012)
  • Jyoetsu, JP (2014)

Company Filing History:

goldMedal23 out of 5,989 
 
Shin-Etsu Chemical Co., Ltd.
 patents

Years Active: 2004-2014

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Areas of Expertise:
Photoacid Generators
Resist Compositions
Patterning Process
Sulfonate Salts
Fluorinated Polymer
Lactone-Containing Compound
Chemically Amplified Resists
Sulfonyldiazomethane Compounds
Nitrogen-Containing Organic Compound
Fluorinated Monomer
Pattern Surface Coating
Chemical Amplification
23 patents (USPTO):Explore Patents
1. 8871427 - Positive resist composition and patterning process (2014-10-28),
2. 8105760 - Patterning process and pattern surface coating composition (2012-01-31),
3. 8030515 - Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process (2011-10-04),
4. 7981589 - Fluorinated monomer, fluorinated polymer, resist composition and patterning process (2011-07-19),
5. 7928262 - Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process (2011-04-19),
6. 7919226 - Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process (2011-04-05),
7. 7833694 - Lactone-containing compound, polymer, resist composition, and patterning process (2010-11-16),
8. 7618765 - Positive resist composition and patterning process (2009-11-17),
9. 7569324 - Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process (2009-08-04),
10. 7556909 - Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process (2009-07-07),
11. 7541133 - Positive resist composition and patterning process (2009-06-02),
12. 7531290 - Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process (2009-05-12),
13. 7511169 - Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process (2009-03-31),
14. 7282316 - Sulfonyldiazomethane compounds, photoacid generator, resist materials and patterning using the same (2007-10-16),
15. 7276324 - Nitrogen-containing organic compound, resist composition and patterning process (2007-10-02),

Title: The Innovative Journey of Katsuhiro Kobayashi

Introduction: Katsuhiro Kobayashi, a pioneering inventor hailing from Joetsu, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Katsuhiro Kobayashi's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles and cutting-edge medical devices for minimally invasive surgeries.

Career Highlights: With a career spanning over two decades, Kobayashi has been at the forefront of technological advancements, holding multiple patents in the fields of robotics, nanotechnology, and renewable energy.

Collaborations: Throughout his career, Katsuhiro Kobayashi has collaborated with leading research institutions, universities, and tech companies to further develop and implement his innovative ideas, solidifying his reputation as a visionary inventor.

Conclusion: Katsuhiro Kobayashi's relentless pursuit of innovation and his passion for pushing the boundaries of technology have cemented his legacy as a trailblazing inventor in the global landscape of inventions and patents.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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