The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
Nov. 10, 2004
Applicants:
Takeru Watanabe, Niigata-ken, JP;
Takeshi Kinsho, Niigata-ken, JP;
Koji Hasegawa, Niigata-ken, JP;
Katsuya Takemura, Niigata-ken, JP;
Kazumi Noda, Niigata-ken, JP;
Katsuhiro Kobayashi, Niigata-ken, JP;
Inventors:
Takeru Watanabe, Niigata-ken, JP;
Takeshi Kinsho, Niigata-ken, JP;
Koji Hasegawa, Niigata-ken, JP;
Katsuya Takemura, Niigata-ken, JP;
Kazumi Noda, Niigata-ken, JP;
Katsuhiro Kobayashi, Niigata-ken, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/73 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Chemically amplified resist compositions comprising nitrogen-containing organic compounds having an aromatic carboxylic acid ester structure have an excellent resolution and provide a precise pattern profile and are useful in microfabrication using electron beams or deep-UV light.