The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Oct. 27, 2006
Katsuhiro Kobayashi, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Katsuhiro Kobayashi, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Takeshi Kinsho, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
Sulfonate salts have the formula: CF—CH(OH)—CFSOMwherein Mis a Li, Na, K, ammonium or tetramethylammonium ion. Because of inclusion within the molecule of a hydroxyl group which is a polar group, the sulfonic acids are effective for restraining the length of acid diffusion through hydrogen bond or the like. The photoacid generators that generate these sulfonic acids perform well during the device fabrication process including coating, pre-baking, exposure, post-exposure baking, and developing steps. The photoacid generators are little affected by water left on the wafer during the ArF immersion lithography.