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For the Inventor, By the Inventor

Joetsu, Japan

Youichi Ohsawa

This inventor holds 88 USPTO granted patents and 14 EPO patents, primarily in Photoresist Technology (CPC class G03F7-004). Top assignees: Shin-Etsu Chemical Co., Ltd., Nippon Telegraph and Telephone Corporation, Shin-Estu Chemical Co., Ltd.. Active years: 1996-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Youichi Ohsawa. Retrieved from https://idiyas.com/inventor/youichi-ohsawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 88

% Patents Active = 96.6

 

Average Co-Inventor Count = 4.0

ph-index = 17

Forward Citations = 929(Granted Patents)

Forward Citations (Not Self Cited) = 824(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Nakakubiki-gun, JP (1997 - 2006)
  • Niigata-ken, JP (1996 - 2007)
  • Niigata, JP (2008 - 2014)
  • Jyoetsu, JP (2012 - 2014)
  • Joetsu, JP (2007 - 2016)

Company Filing History:

goldMedal87 out of 5,989 
 
Shin-Etsu Chemical Co., Ltd.
 patents
silverMedal1 out of 5,300 
 
Nippon Telegraph and Telephone Corporation
 patents
bronzeMedal1 out of 24 
 
Shin-Estu Chemical Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1996-2016

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Areas of Expertise:
Photoresist
Sulfonium Salt
Chemically Amplified
Patterning Process
Resist Composition
Photoacid Generator
Thermal Acid Generator
ArF Lithography
Polymer
Negative Resist
Positive Resist
Photosensitive
88 patents (USPTO):Explore Patents
1. 9233919 - Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method (2016-01-12),
2. 8900793 - Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition (2014-12-02),
3. 8859181 - Chemically amplified negative resist composition and patterning process (2014-10-14),
4. 8822136 - Patterning process and resist composition (2014-09-02),
5. 8815492 - Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process (2014-08-26),
6. 8795942 - Positive resist composition and patterning process (2014-08-05),
7. 8785105 - Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method (2014-07-22),
8. 8741554 - Patterning process and resist composition (2014-06-03),
9. 8741546 - Patterning process and resist composition (2014-06-03),
10. 8703384 - Positive resist composition and patterning process (2014-04-22),
11. 8691490 - Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process (2014-04-08),
12. 8686166 - Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom (2014-04-01),
13. 8632939 - Polymer, chemically amplified positive resist composition and pattern forming process (2014-01-21),
14. 8628908 - Chemically amplified resist composition and patterning process (2014-01-14),
15. 8609889 - Photoacid generator, resist composition, and patterning process (2013-12-17),

Title: The Innovative Journey of Youichi Ohsawa

Introduction: Youichi Ohsawa, a distinguished inventor hailing from Joetsu, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Ohsawa's latest patents focus on advancements in renewable energy technologies, particularly in the development of solar power systems that are more efficient and cost-effective.

Career Highlights: With a career spanning over two decades, Ohsawa has worked tirelessly to push the boundaries of technological innovation. His work has been recognized globally, earning him prestigious awards for his contributions to the field.

Collaborations: Ohsawa has collaborated with leading research institutions and universities to further his research and bring his inventions to life. His partnerships have been instrumental in the success of his projects.

Conclusion: Youichi Ohsawa's passion for innovation and dedication to creating a sustainable future through technology make him a true pioneer in the world of inventions. His work continues to inspire and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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