Youichi Ohsawa

This inventor holds 88 USPTO granted patents and 14 EPO patents, primarily in Photoresist Technology (CPC class G03F7-004). Top assignees: Shin-Etsu Chemical Co., Ltd., Nippon Telegraph and Telephone Corporation, Shin-Estu Chemical Co., Ltd.. Active years: 1996-2016.

USPTO Granted Patents = 88

% Patents Active = 96.6

EPO Patents = 14 (Patent Applications = 3)

Average Co-Inventor Count = 4.0

ph-index = 17

Forward Citations = 929(Granted Patents)

Forward Citations (Not Self Cited) = 824(Dec 10, 2025)

Inventors with similar research interests:

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Location History:

Nakakubiki-gun, JP (1997 - 2006)
Niigata-ken, JP (1996 - 2007)
Niigata, JP (2008 - 2014)
Jyoetsu, JP (2012 - 2014)
Joetsu, JP (2007 - 2016)

Company Filing History:

87 out of 5,989

Shin-Etsu Chemical Co., Ltd.

patents

1 out of 5,300

Nippon Telegraph and Telephone Corporation

patents

1 out of 24

Shin-Estu Chemical Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 1996-2016

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Areas of Expertise:

Photoresist

Sulfonium Salt

Chemically Amplified

Patterning Process

Resist Composition

Photoacid Generator

Thermal Acid Generator

ArF Lithography

Polymer

Negative Resist

Positive Resist

Photosensitive

88 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9233919 - Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method (2016-01-12),

2. 8900793 - Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition (2014-12-02),

3. 8859181 - Chemically amplified negative resist composition and patterning process (2014-10-14),

4. 8822136 - Patterning process and resist composition (2014-09-02),

5. 8815492 - Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process (2014-08-26),

6. 8795942 - Positive resist composition and patterning process (2014-08-05),

7. 8785105 - Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method (2014-07-22),

8. 8741554 - Patterning process and resist composition (2014-06-03),

9. 8741546 - Patterning process and resist composition (2014-06-03),

10. 8703384 - Positive resist composition and patterning process (2014-04-22),

11. 8691490 - Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process (2014-04-08),

12. 8686166 - Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom (2014-04-01),

13. 8632939 - Polymer, chemically amplified positive resist composition and pattern forming process (2014-01-21),

14. 8628908 - Chemically amplified resist composition and patterning process (2014-01-14),

15. 8609889 - Photoacid generator, resist composition, and patterning process (2013-12-17),

Title: The Innovative Journey of Youichi Ohsawa

Introduction: Youichi Ohsawa, a distinguished inventor hailing from Joetsu, Japan, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Ohsawa's latest patents focus on advancements in renewable energy technologies, particularly in the development of solar power systems that are more efficient and cost-effective.

Career Highlights: With a career spanning over two decades, Ohsawa has worked tirelessly to push the boundaries of technological innovation. His work has been recognized globally, earning him prestigious awards for his contributions to the field.

Collaborations: Ohsawa has collaborated with leading research institutions and universities to further his research and bring his inventions to life. His partnerships have been instrumental in the success of his projects.

Conclusion: Youichi Ohsawa's passion for innovation and dedication to creating a sustainable future through technology make him a true pioneer in the world of inventions. His work continues to inspire and shape the future of technology.