The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2014
Filed:
Feb. 28, 2012
Takeru Watanabe, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Takeshi Nagata, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Takeru Watanabe, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Takeshi Nagata, Joetsu, JP;
Youichi Ohsawa, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A chemically amplified resist composition is provided comprising (A) a specific tertiary amine compound, (B) a specific acid generator, (C) a base resin having an acidic functional group protected with an acid labile group, which is substantially insoluble in alkaline developer and turns soluble in alkaline developer upon deprotection of the acid labile group, and (D) an organic solvent. The resist composition has a high resolution, improved defect control in the immersion lithography, and good shelf stability.